The sonochemical technique has been already proven as one of the best coating methods for stable functionalization of substrates in a broad range of applications. Here, we report for the first time on the simultaneous sonochemical dyeing and coating with antibacterial metal oxide (MO) nanoparticles of textiles. In this one-step process the antibacterial nanoparticles are synthesized in-situ and deposited together with dye nanoparticles on the fabric surface. It was shown that the antibacterial behavior of the metal oxides was not influenced by the presence of the dyes. Higher K/S values were achieved by sonochemical deposition of the dyes in comparison to a dip-coating (exhaustion) process. The stability of the antibacterial properties and the dye fastness was studied for 72 hours in saline solution aiming at medical applications
In dynamic atomic force microscopy, nanoscale properties are encoded in the higher harmonics. Nevertheless, when gentle interactions and minimal invasiveness are required, these harmonics are typically undetectable. Here, we propose to externally drive an arbitrary number of exact higher harmonics above the noise level. In this way, multiple contrast channels that are sensitive to compositional variations are made accessible. Numerical integration of the equation of motion shows that the external introduction of exact harmonic frequencies does not compromise the fundamental frequency. Thermal fluctuations are also considered within the detection bandwidth of interest and discussed in terms of higher-harmonic phase contrast in the presence and absence of an external excitation of higher harmonics. Higher harmonic phase shifts further provide the means to directly decouple the true topography from that induced by compositional heterogeneity.
Lopez, G.; Ortega, P.; Voz, C.; Martin, I.; Colina, M.A.; Morales, A.; Orpella, A.; Alcubilla, R. Beilstein Journal of Nanotechnology Vol. 4, p. 726-731 DOI: 10.3762/bjnano.4.82 Data de publicació: 2013-11-06 Article en revista
The aim of this work is to study the surface passivation of aluminum oxide/amorphous silicon carbide (Al2O3/a-SiCx) stacks on
both p-type and n-type crystalline silicon (c-Si) substrates as well as the optical characterization of these stacks. Al2O3 films of different thicknesses were deposited by thermal atomic layer deposition (ALD) at 200 °C and were complemented with a layer of a-SiCx deposited by plasma-enhanced chemical vapor deposition (PECVD) to form anti-reflection coating (ARC) stacks with a
total thickness of 75 nm. A comparative study has been carried out on polished and randomly textured wafers. We have experimentally determined the optimum thickness of the stack for photovoltaic applications by minimizing the reflection losses over a wide wavelength range (300–1200 nm) without compromising the outstanding passivation properties of the Al2O3 films. The upper limit of the surface recombination velocity (Seff,max) was evaluated at a carrier injection level corresponding to 1-sun illumination, which
led to values below 10 cm/s. Reflectance values below 2% were measured on textured samples over the wavelength range of