Carregant...
Carregant...

Vés al contingut (premeu Retorn)

Optical and compositional characterization of GaAs(Ti) thin films deposited by R.F. magnetron sputtering

Autor
Boronat, A.; Silvestre, S.; Castañer, L.
Tipus d'activitat
Article en revista
Revista
Journal of non-crystalline solids
Data de publicació
2013-01
Volum
359
Número
1
Pàgina inicial
21
Pàgina final
26
DOI
https://doi.org/10.1016/j.jnoncrysol.2012.09.017 Obrir en finestra nova
Repositori
http://hdl.handle.net/2117/19895 Obrir en finestra nova
URL
http://www.sciencedirect.com/science/article/pii/S0022309312005637 Obrir en finestra nova
Resum
GaAs thin films with Ti incorporated, to which we refer to as GaAs(Ti), have been deposited by R.F. sputtering on fused silica and c-GaAs substrates under different process conditions. The films were characterized by EPMA, XPS and XRD to study the composition and structural dependence on the deposition conditions, paying special attention on the Ti content of the films. The optical responses of the films were analyzed by spectrofotometric, PDS and FTIR measurements. The Ti content is in all the ...
Citació
Boronat, A.; Silvestre, S.; Castañer, L. Optical and compositional characterization of GaAs(Ti) thin films deposited by R.F. magnetron sputtering. "Journal of non-crystalline solids", Gener 2013, vol. 359, núm. 1, p. 21-26.
Paraules clau
GaAs(Ti), Intermediate band (IB), Sputtering
Grup de recerca
MNT - Grup de Recerca en Micro i Nanotecnologies

Participants