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Low temperature magnetization and resistivity measurements in Co based soft magnetic microwires

Autor
Lluma, J.; Vazquez, M.; Hernández, J.M.; Ruiz, J.; Garcia-Beneyteza, J.; Zhukov, A.; Castaño, F.; Zhang, X.; Tejada, J.
Tipus d'activitat
Article en revista
Revista
Journal of magnetism and magnetic materials
Data de publicació
1999-05
Volum
196
Pàgina inicial
821
Pàgina final
823
DOI
https://doi.org/10.1016/S0304-8853(98)00953-6 Obrir en finestra nova
Repositori
http://hdl.handle.net/2117/9389 Obrir en finestra nova
URL
http://www.sciencedirect.com/science/article/pii/S0304885398009536 Obrir en finestra nova
Resum
Magnetization and resistivity measurements, embracing a temperature range 2-300 K, have been performed in glass-coated Co 68Mn 7Si 10B 15 amorphous microwires. The relation between both types of measurements is analyzed. Similar trends of the temperature dependence of the domain structure, magnetization and resistivity are observed. An increase of resistance is found for the saturated state. This increase of the resistivity is analyzed in terms of the domain structure and the presence of domain ...
Citació
Llumà, J. [et al.]. Low temperature magnetization and resistivity measurements in Co based soft magnetic microwires. "Journal of magnetism and magnetic materials", Maig 1999, vol. 196, p. 821-823.
Grup de recerca
PROCOMAME - Processos de Conformació de Materials Metàl·lics

Participants

  • Llumà Fuentes, Jordi  (autor)
  • Vazquez Vazquez, Manuel  (autor)
  • Hernández Guarch, Juan Manuel  (autor)
  • Ruiz Blazquez, Joaquim  (autor)
  • Garcia Beneyteza, J M  (autor)
  • Zhukov, A  (autor)
  • Castaño, F J  (autor)
  • Zhang, X X  (autor)
  • Tejada Palacios, Javier  (autor)