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Improvement of the quality factor of RF integrated inductors by layout optimization

Autor
López-Villegas, J.; Samitier, J.; Cané, C.; Losantos, P.; Bausells, J.
Tipus d'activitat
Article en revista
Revista
IEEE transactions on microwave theory and techniques
Data de publicació
2000-01-01
Volum
48
Número
1
Pàgina inicial
76
Pàgina final
83
DOI
https://doi.org/10.1109/22.817474 Obrir en finestra nova
Repositori
http://hdl.handle.net/2117/20994 Obrir en finestra nova
URL
http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=817474 Obrir en finestra nova
Resum
A systematic method to improve the quality (Q) factor of RF integrated inductors is presented in this paper. The proposed method is based on the layout optimization to minimize the series resistance of the inductor coil, taking into account both ohmic losses, due to conduction currents, and magnetically induced losses, due to eddy currents. The technique is particularly useful when applied to inductors in which the fabrication process includes integration substrate removal. However, it is also a...
Citació
López-Villegas, J.M. [et al.]. Improvement of the quality factor of RF integrated inductors by layout optimization. "IEEE transactions on microwave theory and techniques", 01 Gener 2000, vol. 48, núm. 1, p. 76-83.
Paraules clau
Inductor layout optimization, integrated RF inductor, silicon RFIC’s, silicon micromachining for RF applications

Participants

  • López Villegas, José María  (autor)
  • Samitier Martí, Josep  (autor)
  • Cané Ballart, Carles  (autor)
  • Losantos Viñolas, Pedro  (autor)
  • Bausells Roigé, Joan  (autor)