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Macroporous silicon: efficient antireflective layer on crystalline silicon

Autor
Fonthal, F.; Torres, I.; Rodriguez, A.
Tipus d'activitat
Article en revista
Revista
Journal of materials science. Materials in electronics
Data de publicació
2011-07
Volum
22
Número
7
Pàgina inicial
895
Pàgina final
900
DOI
https://doi.org/10.1007/s10854-010-0232-6 Obrir en finestra nova
Repositori
http://hdl.handle.net/2117/13577 Obrir en finestra nova
URL
http://www.ingentaconnect.com/content/klu/jmse/2011/00000022/00000007/00000232 Obrir en finestra nova
Resum
A macroporous silicon layer (ma-PS) electrochemically grown on crystalline silicon surface can be used as an efficient antireflective layer in optical devices as antireflection coating. In this work, we presented the ma-PS layers fabricated on crystalline silicon (c-Si) n-type and p +-type, obtained by electrochemical etching. The morphology, porosity, thickness of ma-PS layer can be adjusted by controlling the electrochemical formation conditions. The optical behaviour of the antireflective coa...
Citació
Fonthal, F.; Torres, I.; Rodriguez, A. Macroporous silicon: efficient antireflective layer on crystalline silicon. "Journal of materials science. Materials in electronics", Juliol 2011, vol. 22, núm. 7, p. 895-900.
Grup de recerca
MNT - Grup de Recerca en Micro i Nanotecnologies

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