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Lithography aware regular cell design based on a predictive technology model

Author
Gomez, S.; Moll, F.
Type of activity
Journal article
Journal
Journal of low power electronics
Date of publication
2010-12
Volume
6
Number
4
First page
588
Last page
600
Project funding
Synthesis using advanced process technology integrated in regular cells, IPs, architectures, and design platforms
Repository
http://hdl.handle.net/2117/11201 Open in new window
URL
http://openurl.ingenta.com/content?genre=article&issn=1546-1998&volume=6&issue=4&spage=588&epage=600 Open in new window
Abstract
As semiconductor technology advances into the nanoscale era, optical effects such as channel narrowing, corner rounding or line-end pullback are critical to accomplish circuit yield specifications. It is well-demonstrated that layout regularity reduces the increasing impact of process variations on circuit performance and reliability. The aim of this paper is to present the layout design of a regular cell based on 1-D elements which reduces lithography perturbations (ALARC). We depict several un...
Citation
Gómez, S.; Moll, F. Lithography aware regular cell design based on a predictive technology model. "Journal of low power electronics", Desembre 2010, vol. 6, núm. 4, p. 588-600.
Group of research
HIPICS - High Performance Integrated Circuits and Systems

Participants