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Macroporous silicon: efficient antireflective layer on crystalline silicon

Author
Fonthal, F.; Torres, I.; Rodriguez, A.
Type of activity
Journal article
Journal
Journal of materials science. Materials in electronics
Date of publication
2011-07
Volume
22
Number
7
First page
895
Last page
900
DOI
https://doi.org/10.1007/s10854-010-0232-6 Open in new window
Repository
http://hdl.handle.net/2117/13577 Open in new window
URL
http://www.ingentaconnect.com/content/klu/jmse/2011/00000022/00000007/00000232 Open in new window
Abstract
A macroporous silicon layer (ma-PS) electrochemically grown on crystalline silicon surface can be used as an efficient antireflective layer in optical devices as antireflection coating. In this work, we presented the ma-PS layers fabricated on crystalline silicon (c-Si) n-type and p +-type, obtained by electrochemical etching. The morphology, porosity, thickness of ma-PS layer can be adjusted by controlling the electrochemical formation conditions. The optical behaviour of the antireflective coa...
Citation
Fonthal, F.; Torres, I.; Rodriguez, A. Macroporous silicon: efficient antireflective layer on crystalline silicon. "Journal of materials science. Materials in electronics", Juliol 2011, vol. 22, núm. 7, p. 895-900.
Group of research
MNT - Micro and Nanotechnologies Research Group

Participants